Surface-roughness fractality effects in electrical conductivity of single metallic and semiconducting films
Authors:
- G. Palasantzas,
- Józef Barnaś
Abstract
Surface-roughness effects in electrical conductivity of thin metallic and semiconducting films with self-affine fractal surfaces are considered in the framework of the Born approximation. The surface roughness is described by the (Formula presented)-correlation model, and is characterized by the roughness exponent (Formula presented) the in-plane correlation length ξ, and the rms roughness amplitude Δ. In the case of metallic films the conductivity is shown to increase monotonically with (Formula presented) increasing from (Formula presented) to (Formula presented) and with decreasing ratio (Formula presented) For semiconducting quantum wells the conductivity shows a peculiar interplay of quantum-mechanical effects and scattering due to surface roughness. © 1997 The American Physical Society.
- Record ID
- UAMea6c2d1f93e7400f9172242cfb4750b9
- Author
- Journal series
- Physical Review B, ISSN 1098-0121
- Issue year
- 1997
- Vol
- 56
- Pages
- 7726-7731
- ASJC Classification
- ;
- DOI
- DOI:10.1103/PhysRevB.56.7726 Opening in a new tab
- Language
- (en) English
- Score (nominal)
- 0
- Score source
- journalList
- Publication indicators
- = 103; = 100; : 1999 = 1.541; : 2006 (2 years) = 3.107 - 2007 (5 years) =3.124
- Uniform Resource Identifier
- https://researchportal.amu.edu.pl/info/article/UAMea6c2d1f93e7400f9172242cfb4750b9/
- URN
urn:amu-prod:UAMea6c2d1f93e7400f9172242cfb4750b9
* presented citation count is obtained through Internet information analysis and it is close to the number calculated by the Publish or PerishOpening in a new tab system.